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RICOH imagine. change.

リコー電子デバイス株式会社

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0.35µm CMOS Analog Mixed Mode

Process Outline

  • 0.35µm P-Sub 3P3M(3-Poly and 3-Metal) Twin Well CMOS generic process.
  • Transistor Characterizations are as follows;
Device Tr.type Vth[V] *1 Ids[uA/um] Ioff[pA/um]
PMOS 6V Tr. -0.65 332 0.3
4V Tr. -0.80 264 0.2
3V Tr. -0.77 242 0.1
NMOS 6V Tr. 0.64 544 0.1
4V Tr. 0.63 508 0.2
3V Tr. 0.65 504 0.1
  • *1Extrapolated Threshold at Vd=0.1V
  • Vth tunable for customers' needs.

Option Modules

  • Depletion Transistor.
  • 15V Transistor and Drain 20V/Gate 6V Transistor.
  • Vertical PNP Transistor.
  • Triple well.
  • 0.4k and 3.5k-ohm/sq High Resistivity Poly Resister. (* Tunable high resistivity poly to match customer's needs.)
  • Low temperature coefficient Poly Resistor.
  • Double Poly Capacitor (PiP).
  • Laser Trimming Fuse.

Design Environment

  • BSIM3V3 based on analog oriented extraction is used for SPICE simulation.
  • SPICE parameters are ready for HSPICE, SPECTRE and Smart SPICE.
  • Characterization report is available.
  • Logic libraries and I/O libraries are available.
  • ESD protection circuit is available.